✦ LIBER ✦

Plasma Etching of Si, SiO[sub 2], Si[sub 3]N[sub 4], and Resist with Fluorine, Chlorine, and Bromine Compounds

✍ Scribed by Sparks, Douglas R.

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Highly Selective Etching of Si[sub 3]N[s

✍ Suto, S. 📂 Article 📅 1989 🏛 The Electrochemical Society 🌐 English ⚖ 395 KB

Hydrogen Passivation of LPCVD Si[sub 3]N

✍ Jin, Hao; Weber, K. J.; Blakers, A. W. 📂 Article 📅 2007 🏛 The Electrochemical Society 🌐 English ⚖ 122 KB

Pattern Etching of CVD Si[sub 3]N[sub 4]

✍ Deckert, Cheryl A. 📂 Article 📅 1980 🏛 The Electrochemical Society 🌐 English ⚖ 958 KB

Conduction mechanisms in Ta[sub 2]O[sub

✍ Chaneliere, C.; Autran, J. L.; Devine, R. A. B. 📂 Article 📅 1999 🏛 American Institute of Physics 🌐 English ⚖ 334 KB

Investigations of SiO[sub 2]/n-GaN and S

✍ Arulkumaran, S.; Egawa, T.; Ishikawa, H.; Jimbo, T.; Umeno, M. 📂 Article 📅 1998 🏛 American Institute of Physics 🌐 English ⚖ 262 KB

Surface passivation effects on AlGaN/GaN

✍ S. Arulkumaran; T. Egawa; H. Ishikawa; T. Jimbo; Y. Sano 📂 Article 📅 2004 🏛 American Institute of Physics 🌐 English ⚖ 449 KB