Highly Selective Etching of Si[sub 3]N[sub 4] to SiO[sub 2] Employing Fluorine and Chlorine Atoms Generated by Microwave Discharge

✍ Scribed by Suto, S.

• Book ID: 118183374
• Publisher: The Electrochemical Society
• Year: 1989
• Tongue: English
• Weight: 395 KB
• Volume: 136
• Category: Article
• ISSN: 0013-4651
• DOI: 10.1149/1.2097146