✦ LIBER ✦

Hydrogen Passivation of LPCVD Si[sub 3]N[sub 4]∕SiO[sub 2]∕Si Stacks by Ammonia Plasma Treatment

✍ Scribed by Jin, Hao; Weber, K. J.; Blakers, A. W.

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Conduction mechanisms in Ta[sub 2]O[sub

✍ Chaneliere, C.; Autran, J. L.; Devine, R. A. B. 📂 Article 📅 1999 🏛 American Institute of Physics 🌐 English ⚖ 334 KB

Excess silicon at the Si[sub 3]N[sub 4]/

✍ V. A. Gritsenko; I. P. Petrenko; S. N. Svitasheva; H. Wong 📂 Article 📅 1998 🏛 American Institute of Physics 🌐 English ⚖ 329 KB

Plasma Etching of Si, SiO[sub 2], Si[sub

✍ Sparks, Douglas R. 📂 Article 📅 1992 🏛 The Electrochemical Society 🌐 English ⚖ 654 KB

Determination of density profile of ultr

✍ Banerjee, S.; Ferrari, S.; Piagge, R.; Spandoni, S. 📂 Article 📅 2004 🏛 American Institute of Physics 🌐 English ⚖ 276 KB

Pattern Etching of CVD Si[sub 3]N[sub 4]

✍ Deckert, Cheryl A. 📂 Article 📅 1980 🏛 The Electrochemical Society 🌐 English ⚖ 958 KB

Surface passivation effects on AlGaN/GaN

✍ S. Arulkumaran; T. Egawa; H. Ishikawa; T. Jimbo; Y. Sano 📂 Article 📅 2004 🏛 American Institute of Physics 🌐 English ⚖ 449 KB