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Photoenhanced reactive ion etching of III–V nitrides in BCl[sub 3]/Cl[sub 2]/Ar/N[sub 2] plasmas

✍ Scribed by Tempez, A.; Medelci, N.; Badi, N.; Berishev, I.; Starikov, D.; Bensaoula, A.

Book ID: 125848355
Publisher: AVS (American Vacuum Society)
Year: 1999
Tongue: English
Weight: 319 KB
Volume: 17
Category: Article
ISSN: 0734-2101
DOI: 10.1116/1.581748

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