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Comparison of dry etching of AlGaAs and InGaP in a planar inductively coupled BCl[sub 3] plasma

✍ Scribed by Baek, I. K.; Lim, W. T.; Lee, J. W.; Jeon, M. H.; Cho, G. S.; Pearton, S. J.

Book ID: 127332004
Publisher: AVS (American Vacuum Society)
Year: 2003
Tongue: English
Weight: 936 KB
Volume: 21
Category: Article
ISSN: 0734-211X
DOI: 10.1116/1.1615984

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