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Resist process development for sub-100-nm ion projection lithography

✍ Scribed by S Hirscher; R Kaesmaier; W.-D Domke; A Wolter; H Löschner; E Cekan; C Horner; M Zeininger; J Ochsenhirt

No coin nor oath required. For personal study only.

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Low stress silicon stencil masks for sub

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