Resist materials for sub-0.5-μm pattern transfer with demagnifying ion projection lithography (IPL)

✍ Scribed by G. Stangl; E. Cekan; S. Jacob; W. Fallmann; F. Paschke; L.M. Buchmann; K.P. Müller; L. Csepregi; A. Heuberger; E. Hammel; C. Traher; H. Löschner; G. Stengl

• Book ID: 107920383
• Publisher: Elsevier Science
• Year: 1989
• Tongue: English
• Weight: 723 KB
• Volume: 9
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(89)90067-1