✦ LIBER ✦
Sub-0.25-μm ion projection lithography (IPL) in PMMA- and novolak-based resist materials (RAY-PF, RAY-PN, SAL-603)
✍ Scribed by E. Cekan; W. Fallmann; W. Friza; F. Paschke; G. Stangl; P. Hudek; E. Bayer; H. Kraus
- Publisher
- Elsevier Science
- Year
- 1992
- Tongue
- English
- Weight
- 483 KB
- Volume
- 17
- Category
- Article
- ISSN
- 0167-9317
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