✦ LIBER ✦
Low stress silicon stencil masks for sub-100 nm ion beam lithography
✍ Scribed by F.-O. Fong; D.P. Stumbo; S. Sen; G. Damm; D.W. Engler; J.C. Wolfe; J.N. Randall; Philip Mauger; A. Shimkunas
- Publisher
- Elsevier Science
- Year
- 1990
- Tongue
- English
- Weight
- 435 KB
- Volume
- 11
- Category
- Article
- ISSN
- 0167-9317
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