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Evaluation of advanced epoxy novolac resist, EPR, for sub 100nm synchrotron x-ray proximity lithography

✍ Scribed by Yongduck Seo; Kyoungho Lee; Moonsuk Yi; Eunsung Seo; Bo Kyung Choi; Ohyun Kim; Ioannis Raptis; Panayiotis Argitis; Michael Hatzakis


Book ID
104306546
Publisher
Elsevier Science
Year
1999
Tongue
English
Weight
803 KB
Volume
46
Category
Article
ISSN
0167-9317

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