✦ LIBER ✦
Newly developed novolak-based resist materials for ion projection lithography (IPL) with structure dimensions of 200-100 nanometers
✍ Scribed by G. Stangl; E. Cekan; Ch. Eckes; W. Friza; F. Thalinger; A. Bruckner; P. Hudek; W. Fallmann
- Publisher
- Elsevier Science
- Year
- 1993
- Tongue
- English
- Weight
- 506 KB
- Volume
- 21
- Category
- Article
- ISSN
- 0167-9317
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