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Ion projection lithography below 70 nm: tool performance and resist process

✍ Scribed by S. Hirscher; M. Kümmel; O. Kirch; W.-D. Domke; A. Wolter; R. Käsmaier; H. Buschbeck; E. Cekan; A. Chalupka; A. Chylik; S. Eder; C. Horner; H. Löschner; R. Nowak; G. Stengl; T. Windischbauer; M. Zeininger

Book ID: 114155454
Publisher: Elsevier Science
Year: 2002
Tongue: English
Weight: 859 KB
Volume: 61-62
Category: Article
ISSN: 0167-9317
DOI: 10.1016/s0167-9317(02)00529-4

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