Ideal projection lithography using a multilayer resist process : E. David Liu, Michael M. O'Toole and Mark S. Chang. Solid St. Technol., 66 (May 1982)

• Book ID: 103276334
• Publisher: Elsevier Science
• Year: 1983
• Tongue: English
• Weight: 127 KB
• Volume: 23
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(83)90413-4