Ideal projection lithography using a multilayer resist process: E. David Liu, Michael M. O'Toole and Mark S. Chang Solid St. Technol., 66 (May 1982)

• Book ID: 108361351
• Publisher: Elsevier Science
• Year: 1985
• Tongue: English
• Weight: 102 KB
• Volume: 16
• Category: Article
• ISSN: 0026-2692
• DOI: 10.1016/s0026-2692(85)80098-7