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Remote hydrogen microwave plasma chemical vapor deposition of silicon carbonitride films from a (dimethylamino)dimethylsilane precursor: Characterization of the process, chemical structure, and surface morphology of the films

✍ Scribed by Blaszczyk-Lezak, I.; Wrobel, A.M.; Kivitorma, M.P.M.; Vayrynen, I.J.; Aoki, T.

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