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Remote hydrogen microwave plasma chemical vapor deposition of silicon carbonitride films from a (dimethylamino)dimethylsilane precursor: Compositional and structural dependencies of film properties

✍ Scribed by Blaszczyk-Lezak, I.; Wrobel, A.M.; Bielinski, D.M.

Book ID: 122907713
Publisher: Elsevier Science
Year: 2006
Tongue: English
Weight: 251 KB
Volume: 15
Category: Article
ISSN: 0925-9635
DOI: 10.1016/j.diamond.2006.01.019

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