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Remote hydrogen microwave plasma chemical vapor deposition from methylsilane precursors. 2. Surface morphology and properties of deposited a-SiC:H films

✍ Scribed by Wrobel, A.M.; Walkiewicz-Pietrzykowska, A.; Uznanski, P.

Book ID: 122114844
Publisher: Elsevier Science
Year: 2014
Tongue: English
Weight: 580 KB
Volume: 564
Category: Article
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2014.04.089

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## Abstract The surface morphology and physical (density), optical (refractive index), and mechanical (hardness, elasticity) properties of amorphous hydrogenated silicon carbide (a‐SiC:H) films produced by remote microwave hydrogen plasma (RHP)CVD from a triethylsilane precursor are investigated. T