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Remote Hydrogen Plasma Chemical Vapor Deposition from (Dimethylsilyl)(trimethylsilyl)methane. 1. Kinetics of the Process; Chemical and Morphological Structure of Deposited Silicon−Carbon Films

✍ Scribed by Wróbel, A. M.; Walkiewicz-Pietrzykowska, A.; Klemberg-Sapieha, J. E.; Nakanishi, Y.; Aoki, T.; Hatanaka, Y.

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