✦ LIBER ✦

Reliability characteristics of high-K gate dielectrics HfO2 in metal-oxide semiconductor capacitors

✍ Scribed by Dedong Han; Jinfeng Kang; Changhai Lin; Ruqi Han

Book ID: 108411266
Publisher: Elsevier Science
Year: 2003
Tongue: English
Weight: 146 KB
Volume: 66
Category: Article
ISSN: 0167-9317
DOI: 10.1016/s0167-9317(02)00977-2

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