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Investigations of GaN metal-oxide-semiconductor capacitors with sputtered HfO2 gate dielectrics

✍ Scribed by C.F. Shih; K.T. Hung; C.Y. Hsiao; S.C. Shu; W.M. Li

Book ID: 116604775
Publisher: Elsevier Science
Year: 2009
Tongue: English
Weight: 877 KB
Volume: 480
Category: Article
ISSN: 0925-8388
DOI: 10.1016/j.jallcom.2009.01.141

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