Growth of GaN on SiC(0001) by Molecular
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Lee, C.D. ;Sagar, Ashutosh ;Feenstra, R.M. ;Sarney, W.L. ;Salamanca-Riba, L. ;Hs
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Article
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2001
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John Wiley and Sons
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English
β 188 KB
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GaN films are grown by plasma-assisted molecular beam epitaxy on 6H-SiC(0001) substrates. Suitable substrate preparation and growth conditions are found which greatly improve the structural quality of the films. Threading dislocation densities of about 1 Γ 10 9 cm --2 for edge dislocations and 1 Γ 1