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Reduction of threading defects in GaN grown on vicinal SiC(0001) by molecular-beam epitaxy

✍ Scribed by Xie, M. H.; Zheng, L. X.; Cheung, S. H.; Ng, Y. F.; Wu, Huasheng; Tong, S. Y.; Ohtani, N.


Book ID
121752921
Publisher
American Institute of Physics
Year
2000
Tongue
English
Weight
377 KB
Volume
77
Category
Article
ISSN
0003-6951

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Growth of GaN on SiC(0001) by Molecular
✍ Lee, C.D. ;Sagar, Ashutosh ;Feenstra, R.M. ;Sarney, W.L. ;Salamanca-Riba, L. ;Hs πŸ“‚ Article πŸ“… 2001 πŸ› John Wiley and Sons 🌐 English βš– 188 KB πŸ‘ 1 views

GaN films are grown by plasma-assisted molecular beam epitaxy on 6H-SiC(0001) substrates. Suitable substrate preparation and growth conditions are found which greatly improve the structural quality of the films. Threading dislocation densities of about 1 Γ‚ 10 9 cm --2 for edge dislocations and 1 Γ‚ 1