GaN films are grown by plasma-assisted molecular beam epitaxy on 6H-SiC(0001) substrates. Suitable substrate preparation and growth conditions are found which greatly improve the structural quality of the films. Threading dislocation densities of about 1 Γ 10 9 cm --2 for edge dislocations and 1 Γ 1
β¦ LIBER β¦
Defect-controlled growth of GaN nanorods on (0001)sapphire by molecular beam epitaxy
β Scribed by Cherns, D.; Meshi, L.; Griffiths, I.; Khongphetsak, S.; Novikov, S. V.; Farley, N. R. S.; Campion, R. P.; Foxon, C. T.
- Book ID
- 120051538
- Publisher
- American Institute of Physics
- Year
- 2008
- Tongue
- English
- Weight
- 420 KB
- Volume
- 93
- Category
- Article
- ISSN
- 0003-6951
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