GaN films are grown by plasma-assisted molecular beam epitaxy on 6H-SiC(0001) substrates. Suitable substrate preparation and growth conditions are found which greatly improve the structural quality of the films. Threading dislocation densities of about 1 Γ 10 9 cm --2 for edge dislocations and 1 Γ 1
Preferential Growth Mode of Cubic GaN by Metalorganic Molecular Beam Epitaxy on Sapphire (0001) Substrates
β Scribed by Suda, J. ;Kurobe, T. ;Masuda, T. ;Matsunami, H.
- Publisher
- John Wiley and Sons
- Year
- 1999
- Tongue
- English
- Weight
- 152 KB
- Volume
- 176
- Category
- Article
- ISSN
- 0031-8965
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