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Reactive sputtering of (Co,Fe) nitride thin films on TiN-bufferd Si

✍ Scribed by Xiang, H.; Shi, F.-Y.; Rzchowski, M. S.; Voyles, P. M.; Chang, Y. A.

Book ID
118782242
Publisher
Springer
Year
2012
Tongue
English
Weight
806 KB
Volume
110
Category
Article
ISSN
1432-0630

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Physical properties of reactive sputtered tin-nitride thin films
✍ Y Inoue; M Nomiya; O Takai πŸ“‚ Article πŸ“… 1998 πŸ› Elsevier Science 🌐 English βš– 302 KB

We report on the physical properties of tin-nitride thin films deposited onto glass substrates by rf reactive sputtering. The crystal structure of the tin-nitride films is hexagonal and the lattice parameters are calculated from X-ray diffraction patterns as a = 0.369 nm and c = 0.529 nm. X-ray phot