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Physical properties of reactive sputtered tin-nitride thin films

✍ Scribed by Y Inoue; M Nomiya; O Takai

Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
302 KB
Volume
51
Category
Article
ISSN
0042-207X

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✦ Synopsis

We report on the physical properties of tin-nitride thin films deposited onto glass substrates by rf reactive sputtering. The crystal structure of the tin-nitride films is hexagonal and the lattice parameters are calculated from X-ray diffraction patterns as a = 0.369 nm and c = 0.529 nm. X-ray photoelectron spectroscopy reveals the bonding states of the polycrystalline tin-nitride films. Photoelectron lines and Auger lines are discussed in detail.

πŸ“œ SIMILAR VOLUMES

Physical properties of TiN thin films
Physical properties of TiN thin films
✍ F. Marchetti; M. Dapor; S. Girardi; F. Giacomozzi; A. Cavalleri πŸ“‚ Article πŸ“… 1989 πŸ› Elsevier Science 🌐 English βš– 350 KB

This" paper reports on the characterization of films of titanium nitride (TIN) obtained by reactive sputtering of titanium in a nitrogen-rich ambient (r.f. sputtering) and by nitrogen implantation during vapour deposition of titanium thin films. In order to get a complete picture of the properties