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Physical properties of TiN thin films

✍ Scribed by F. Marchetti; M. Dapor; S. Girardi; F. Giacomozzi; A. Cavalleri


Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
350 KB
Volume
115
Category
Article
ISSN
0921-5093

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✦ Synopsis


This" paper reports on the characterization of films of titanium nitride (TIN) obtained by reactive sputtering of titanium in a nitrogen-rich ambient (r.f. sputtering) and by nitrogen implantation during vapour deposition of titanium thin films.

In order to get a complete picture of the properties of the atoms in these systems the thin films were characterized with Auger electron spectroscopy and with a Seeman-Bohlin X-ray diffractometer. The overlayers were analysed by four-point probe to evaluate the resistivity.

The observed chemical and physical properties of the films strongly depend on both the growth technique and the particular parameters employed.


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