✦ LIBER ✦

Effects of processing parameters on the properties of tantalum nitride thin films deposited by reactive sputtering

✍ Scribed by J. Nazon; J. Sarradin; V. Flaud; J.C. Tedenac; N. Fréty

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Electrical and structural properties of

✍ R. Petrović; T. Nenadović; N. Kraljević; T. Dimitrijević 📂 Article 📅 1979 🏛 Elsevier Science 🌐 English ⚖ 437 KB

Study on microstructural, chemical and e

✍ Michaela Grosser; M. Münch; J. Brenner; M. Wilke; H. Seidel; C. Bienert; A. Roos 📂 Article 📅 2010 🏛 Springer-Verlag 🌐 English ⚖ 396 KB

Biomedical properties of tantalum nitrid

✍ Y.X Leng; H Sun; P Yang; J.Y Chen; J Wang; G.J Wan; N Huang; X.B Tian; L.P Wang; 📂 Article 📅 2001 🏛 Elsevier Science 🌐 English ⚖ 657 KB

Spectroscopic investigation of tantalum

✍ S Dontchev; P Georgiev; K Gerassimova; J Kourtev 📂 Article 📅 1985 🏛 Elsevier Science 🌐 English ⚖ 296 KB

Properties of silicon nitride thin films

✍ Witold Posadowski 📂 Article 📅 1980 🏛 Elsevier Science 🌐 English ⚖ 346 KB

Field emission property of copper nitrid

✍ T. Wang; X.J. Pan; X.M. Wang; H.G. Duan; R.S. Li; H. Li; E.Q. Xie 📂 Article 📅 2008 🏛 Elsevier Science 🌐 English ⚖ 289 KB