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Study on microstructural, chemical and electrical properties of tantalum nitride thin films deposited by reactive direct current magnetron sputtering

✍ Scribed by Michaela Grosser; M. Münch; J. Brenner; M. Wilke; H. Seidel; C. Bienert; A. Roosen; U. Schmid

Publisher: Springer-Verlag
Year: 2010
Tongue: English
Weight: 396 KB
Volume: 16
Category: Article
ISSN: 0946-7076
DOI: 10.1007/s00542-009-0993-0

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