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Structural and electrical properties of tantalum nitride thin films fabricated by using reactive radio-frequency magnetron sputtering

✍ Scribed by Nie, H. B. (author);Xu, S. Y. (author);Wang, S. J. (author);You, L. P. (author);Yang, Z. (author);Ong, C. K. (author);Li, J. (author);Liew, T. Y.F. (author)

Publisher
Springer Verlag
Year
2001
Tongue
English
Weight
905 KB
Volume
73
Category
Article
ISSN
1432-0630

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