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Structural and electrical properties of radio frequency magnetron sputtered tantalum oxide films: Influence of post-deposition annealing

โœ Scribed by S.V. Jagadeesh Chandra; Chel-Jong Choi; S. Uthanna; G. Mohan Rao

Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
755 KB
Volume
13
Category
Article
ISSN
1369-8001

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