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Properties of silicon nitride thin films obtained by reactive sputtering

✍ Scribed by Witold Posadowski


Book ID
107862719
Publisher
Elsevier Science
Year
1980
Tongue
English
Weight
346 KB
Volume
69
Category
Article
ISSN
0040-6090

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Physical properties of reactive sputtere
✍ Y Inoue; M Nomiya; O Takai πŸ“‚ Article πŸ“… 1998 πŸ› Elsevier Science 🌐 English βš– 302 KB

We report on the physical properties of tin-nitride thin films deposited onto glass substrates by rf reactive sputtering. The crystal structure of the tin-nitride films is hexagonal and the lattice parameters are calculated from X-ray diffraction patterns as a = 0.369 nm and c = 0.529 nm. X-ray phot