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R.f. reactive sputtering of zinc oxide films on silicon and SiSiO2TiN substrates

✍ Scribed by V. Tvarožek; I. Novotný; I. Červeň; J. Kováč; T. Lacko

Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
392 KB
Volume
30
Category
Article
ISSN
0924-4247

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