✦ LIBER ✦

Reactive Ion Etching of Zinc Oxide Using Methane and Hydrogen

✍ Scribed by Guo, Qixin; Uesugi, Nozomu; Tanaka, Tooru; Nishio, Mitsuhiro; Ogawa, Hiroshi

Book ID: 127211716
Publisher: Institute of Pure and Applied Physics
Year: 2006
Tongue: English
Weight: 117 KB
Volume: 45
Category: Article
ISSN: 0021-4922
DOI: 10.1143/jjap.45.8597

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Reactive ion etching of zinc oxide (ZnO)

Reactive ion etching of zinc oxide (ZnO) in SiCl4 based plasmas

✍ Mastropaolo, E.; Gundlach, A.M.; Fragkiadakis, C.; Kirby, P.B.; Cheung, R. 📂 Article 📅 2007 🏛 The Institution of Electrical Engineers 🌐 English ⚖ 81 KB

Reactive ion etching of gallium nitride

Reactive ion etching of gallium nitride using hydrogen bromide plasmas

✍ Adesida, I.; Kuznia, J.N.; Ping, A.T.; Asif Khan, M. 📂 Article 📅 1994 🏛 The Institution of Electrical Engineers 🌐 English ⚖ 283 KB

Etch Characteristics of Nickel Oxide Thi

Etch Characteristics of Nickel Oxide Thin Films Using Inductively Coupled Plasma Reactive Ion Etching

✍ Cho, Han Na; Min, Su Ryun; Bae, Hyung Jin; Lee, Jung Hyun; Chung, Chee Won 📂 Article 📅 2008 🏛 The Electrochemical Society 🌐 English ⚖ 520 KB

The Reactive Ion Etching of Gallium Nitr

The Reactive Ion Etching of Gallium Nitride by Methylchloride/Hydrogen

✍ Dineen, M. ;Thomas, H. ;Humphreys, B. ;McMeekin, S. G. 📂 Article 📅 1999 🏛 John Wiley and Sons 🌐 English ⚖ 128 KB 👁 2 views

Shallow and deep dry etching of silicon

Shallow and deep dry etching of silicon using ICP cryogenic reactive ion etching process

✍ Ü. Sökmen; A. Stranz; S. Fündling; S. Merzsch; R. Neumann; H.-H. Wehmann; E. Pei 📂 Article 📅 2010 🏛 Springer-Verlag 🌐 English ⚖ 969 KB

Fabrication of Si microstructures using

Fabrication of Si microstructures using focused ion beam implantation and reactive ion etching

✍ Qian, H X; Zhou, Wei; Miao, Jianmin; Lim, Lennie E N; Zeng, X R 📂 Article 📅 2008 🏛 Institute of Physics 🌐 English ⚖ 867 KB