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Etch Characteristics of Nickel Oxide Thin Films Using Inductively Coupled Plasma Reactive Ion Etching

โœ Scribed by Cho, Han Na; Min, Su Ryun; Bae, Hyung Jin; Lee, Jung Hyun; Chung, Chee Won

Book ID
123620291
Publisher
The Electrochemical Society
Year
2008
Tongue
English
Weight
520 KB
Volume
11
Category
Article
ISSN
1099-0062

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u ร€ 2u scan for the as-deposited FePt film. The diffraction peaks associated with the formation of L1 0 ordered structure were clearly observed . Furthermore, the magnetic property of the film was investigated employing a superconducting quantum interference device (SQUID) magnetometer with the magn