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Etch characteristics of FePt magnetic thin films using inductively coupled plasma reactive ion etching

โœ Scribed by Eun Ho Kim; Yu Bin Xiao; Seon Mi Kong; Chee Won Chung


Book ID
113936959
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
751 KB
Volume
519
Category
Article
ISSN
0040-6090

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Reactive ion etching of FePt using induc
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u ร€ 2u scan for the as-deposited FePt film. The diffraction peaks associated with the formation of L1 0 ordered structure were clearly observed . Furthermore, the magnetic property of the film was investigated employing a superconducting quantum interference device (SQUID) magnetometer with the magn