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Reactive ion etching of gallium nitride using hydrogen bromide plasmas

✍ Scribed by Adesida, I.; Kuznia, J.N.; Ping, A.T.; Asif Khan, M.

Book ID: 120164519
Publisher: The Institution of Electrical Engineers
Year: 1994
Tongue: English
Weight: 283 KB
Volume: 30
Category: Article
ISSN: 0013-5194
DOI: 10.1049/el:19941247

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