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Reactive ion etching of gallium nitride in silicon tetrachloride plasmasa)

✍ Scribed by Adesida, I.; Mahajan, A.; Andideh, E.; Khan, M. Asif; Olsen, D. T.; Kuznia, J. N.


Book ID
121326916
Publisher
American Institute of Physics
Year
1993
Tongue
English
Weight
615 KB
Volume
63
Category
Article
ISSN
0003-6951

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