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Quantum chemical study of the initial surface reactions of HfO[sub 2] atomic layer deposition on the hydroxylated GaAs(001)-4Ã2 surface

✍ Scribed by Lu, Hong-Liang; Xu, Min; Ding, Shi-Jin; Chen, Wei; Zhang, David Wei; Wang, Li-Kang

No coin nor oath required. For personal study only.

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Quantum chemical study of the initial surface reactions of HfO[sub 2] atomic layer deposition on the hydroxylated GaAs(001)-4Ã2 surface