The initial atomic layer deposition of HfO[sub 2]∕Si(001) as followed in situ by synchrotron radiation photoelectron spectroscopy

✍ Scribed by Tallarida, Massimo; Karavaev, Konstantin; Schmeisser, Dieter

• Book ID: 120325439
• Publisher: American Institute of Physics
• Year: 2008
• Tongue: English
• Weight: 744 KB
• Volume: 104
• Category: Article
• ISSN: 0021-8979
• DOI: 10.1063/1.2978362