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Surface reaction mechanism of Y2O3 atomic layer deposition on the hydroxylated Si(1 0 0)-2 × 1: A density functional theory study

✍ Scribed by Jie Ren; Guangfen Zhou; Yongqi Hu; David Wei Zhang


Book ID
108063905
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
417 KB
Volume
255
Category
Article
ISSN
0169-4332

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