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Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer

✍ Scribed by Dae-Yong Moon; Dong-Suk Han; Jae-Hyung Park; Sae-Young Shin; Jong-Wan Park; Baek Mann Kim; Jun Yeol Cho

No coin nor oath required. For personal study only.

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