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Plasma enhanced atomic layer deposition of HfO2 with in situ plasma treatment

✍ Scribed by Dawei Xu; Xinhong Cheng; Youwei Zhang; Zhongjian Wang; Chao Xia; Duo Cao; Yuehui Yu; DaShen Shen

Book ID
113797929
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
639 KB
Volume
93
Category
Article
ISSN
0167-9317

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## Abstract In this paper, a method for the plasma‐enhanced (PE) atomic layer deposition (ALD) of palladium on air‐exposed, annealed poly(__p__‐xylylene) (Parylene‐N, or PPX) is presented. Palladium is successfully deposited on PPX at 80 °C using a remote, inductively coupled, hydrogen/nitrogen pla