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Properties of AlN grown by plasma enhanced atomic layer deposition

✍ Scribed by Markus Bosund; Timo Sajavaara; Mikko Laitinen; Teppo Huhtio; Matti Putkonen; Veli-Matti Airaksinen; Harri Lipsanen

Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
999 KB
Volume
257
Category
Article
ISSN
0169-4332

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