✦ LIBER ✦

Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor

✍ Scribed by Park, Jusang; Lee, Han-Bo-Ram; Kim, Doyoung; Yoon, Jaehong; Lansalot, Clement; Gatineau, Julien; Chevrel, Henri; Kim, Hyungjun

Book ID: 123260523
Publisher: Elsevier
Year: 2013
Tongue: English
Weight: 846 KB
Volume: 22
Category: Article
ISSN: 2095-4956
DOI: 10.1016/S2095-4956(13)60052-2

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Thermal and plasma enhanced atomic layer

Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

✍ Putkonen, Matti; Bosund, Markus; Ylivaara, Oili M.E.; Puurunen, Riikka L.; Kilpi 📂 Article 📅 2014 🏛 Elsevier Science 🌐 English ⚖ 664 KB

Atomic Layer Deposition of Co3O4 Thin Fi

Atomic Layer Deposition of Co3O4 Thin Films Using a CoI2/O2 Precursor Combination

✍ M. Rooth; E. Lindahl; A. Hårsta 📂 Article 📅 2006 🏛 John Wiley and Sons 🌐 English ⚖ 394 KB 👁 1 views

Plasma-Enhanced Atomic Layer Deposition

Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc

✍ Pieter C. Rowlette; Cary G. Allen; Olivia B. Bromley; Amy E. Dubetz; Colin A. Wo 📂 Article 📅 2009 🏛 John Wiley and Sons 🌐 English ⚖ 230 KB 👁 1 views

Plasma enhanced atomic layer deposition

Plasma enhanced atomic layer deposition of HfO2 with in situ plasma treatment

✍ Dawei Xu; Xinhong Cheng; Youwei Zhang; Zhongjian Wang; Chao Xia; Duo Cao; Yuehui 📂 Article 📅 2012 🏛 Elsevier Science 🌐 English ⚖ 639 KB

Atomic Layer Deposition of WO3 Thin Film

Atomic Layer Deposition of WO3 Thin Films using W(CO)6 and O3 Precursors

✍ Jari Malm; Timo Sajavaara; Maarit Karppinen 📂 Article 📅 2012 🏛 John Wiley and Sons 🌐 English ⚖ 289 KB

Atomic Layer Deposition of Nanostructure

Atomic Layer Deposition of Nanostructured Materials (PINNA:ALD NANOMATERIALS O-BK) || Plasma Atomic Layer Deposition

✍ Pinna, Nicola; Knez, Mato 📂 Article 📅 2012 🏛 Wiley-VCH Verlag GmbH & Co. KGaA 🌐 German ⚖ 335 KB