Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

✍ Scribed by Putkonen, Matti; Bosund, Markus; Ylivaara, Oili M.E.; Puurunen, Riikka L.; Kilpi, Lauri; Ronkainen, Helena; Sintonen, Sakari; Ali, Saima; Lipsanen, Harri; Liu, Xuwen; Haimi, Eero; Hannula, Simo-Pekka; Sajavaara, Timo; Buchanan, Iain; Karwacki, Eugene; Vähä-Nissi, Mika

• Book ID: 121725201
• Publisher: Elsevier Science
• Year: 2014
• Tongue: English
• Weight: 664 KB
• Volume: 558
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/j.tsf.2014.02.087