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High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal–Organic Silicon Precursor and Oxygen Radical

✍ Scribed by Seok-Jun Won, ; Sungin Suh, ; Myung Soo Huh, ; Hyeong Joon Kim,

Book ID: 120310590
Publisher: IEEE
Year: 2010
Tongue: English
Weight: 132 KB
Volume: 31
Category: Article
ISSN: 0741-3106
DOI: 10.1109/LED.2010.2049978

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