Low-Temperature Silicon Oxide Offset Spacer Using Plasma-Enhanced Atomic Layer Deposition for High- k /Metal Gate Transistor

✍ Scribed by Murata, Tatsunori; Miyagawa, Yoshihiro; Nishida, Yukio; Yamamoto, Yoshiki; Yamashita, Tomohiro; Matsuura, Masazumi; Asai, Koyu; Miyatake, Hiroshi

• Book ID: 120309906
• Publisher: Institute of Pure and Applied Physics
• Year: 2010
• Tongue: English
• Weight: 355 KB
• Volume: 49
• Category: Article
• ISSN: 0021-4922
• DOI: 10.1143/JJAP.49.04DB11