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Physical and electrical characterization of HfO[sub 2] metal–insulator–metal capacitors for Si analog circuit applications

✍ Scribed by Hu, Hang; Zhu, Chunxiang; Lu, Y. F.; Wu, Y. H.; Liew, T.; Li, M. F.; Cho, B. J.; Choi, W. K.; Yakovlev, N.

Book ID: 121687027
Publisher: American Institute of Physics
Year: 2003
Tongue: English
Weight: 590 KB
Volume: 94
Category: Article
ISSN: 0021-8979
DOI: 10.1063/1.1579550

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