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Atomic Layer Deposited High-κ Films and Their Role in Metal-Insulator-Metal Capacitors for Si RF/Analog Integrated Circuit Applications

✍ Scribed by C. Zhu; B.-J. Cho; M.-F. Li


Publisher
John Wiley and Sons
Year
2006
Tongue
English
Weight
613 KB
Volume
12
Category
Article
ISSN
0948-1907

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