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In situ microwave characterisation of medium-k hfo2 and high-k srtio3 dielectrics for metal-insulator-metal capacitors integrated in back-end of line of integrated circuits

✍ Scribed by Vo, T.T.; Lacrevaz, T.; Bermond, C.; Bertaud, T.; Flechet, B.; Farcy, A.; Morand, Y.; Blonkowski, S.; Torres, J.; Guigues, B.; Defay, E.


Book ID
117812449
Publisher
The Institution of Engineering and Technology
Year
2008
Tongue
English
Weight
436 KB
Volume
2
Category
Article
ISSN
1751-8725

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